ISO 23170:2022
p
ISO 23170:2022
74814

Status : Published

en
Format Language
std 1 151 PDF + ePub
std 2 151 Paper
  • CHF151
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Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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General information

  •  : Published
     : 2022-06
    : International Standard published [60.60]
  •  : 1
     : 29
  • ISO/TC 201/SC 4
    71.040.40 
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