Status : Published (Under review)

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Abstract

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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General information

  • Status
     : Published
    Publication date
     : 2019-06
    Stage
    : International Standard under systematic review [90.20]
  • Edition
     : 1
    Number of pages
     : 4
  • Technical Committee :
    ISO/TC 206
    ICS :
    81.060.30 
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Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

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