ISO 14237:2010

Published (Edition 2, 2010)

This publication was last reviewed and confirmed in 2021. Therefore this version remains current.

ISO 14237:2010

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Abstract

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 10¹⁶ atoms/cm³ to 1 x 10²⁰ atoms/cm³.

General information

Status
: Published

Publication date
: 2010-07

Stage
: International Standard confirmed [90.93]
Edition
: 2

Number of pages
: 19
Technical Committee :
ISO/TC 201/SC 6

ICS :
71.040.40
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