This standard has been revised by ISO/TS 25138:2019
Abstract
ISO/TS 25138:2010 describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films.
The method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn and Al. Other elements that can be determined by the method are O, C, N, H, P and S.
-
Status: WithdrawnPublication date: 2010-12
-
Edition: 1Number of pages: 36
-
- ICS :
- 71.040.40 Chemical analysis
Got a question?
Check out our FAQs
Customer care
+41 22 749 08 88
Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)
Keep up to date with ISO
Sign up to our newsletter for the latest news, views and product information.